Optical proximity correction using chamfers and rounding at corners
US7355681B2 · kind B2 · utility
9Cited by
28References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 8, 2005 |
| Grant date | Apr 8, 2008 |
| Priority date | — |
| Expiry date | Jun 25, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/36
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed is a method of optimizing a design to be formed on a substrate. The method includes approximating rounding of at least one corner of an image of the design; generating a representation of the design further to the approximate rounding of the at least one corner; generating an initial representation of a mask utilized to image the design based on the representation; and performing Optical Proximity Correction (OPC) further to the initial representation of the mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.