Lithographic apparatus and device manufacturing method
US7359030B2 · kind B2 · utility
74Cited by
23References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 1, 2003 |
| Grant date | Apr 15, 2008 |
| Priority date | — |
| Expiry date | Feb 17, 2025 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC40B60/14
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
A flowcell including a plurality of separate chambers is provided on the substrate table so that a fluid can be brought into contact with exposed areas of the substrate to interact therewith. A series of exposures and chemical processes can thereby be carried out without removing the substrate from the substrate table.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.