Chemical dilution system for semiconductor device processing system
US7364349B2 · kind B2 · utility
3Cited by
8References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 22, 2006 |
| Grant date | Apr 29, 2008 |
| Priority date | — |
| Expiry date | May 22, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG05D11/133
- WIPO fieldControl
- WIPO sectorInstruments
Abstract
A dilution stage is adapted to supply a dilute chemistry to a semiconductor device processing apparatus. The dilution stage includes a first vessel adapted to store the chemistry after dilution and a second vessel adapted to store the chemistry prior to dilution. The dilution stage may also include a control mechanism which is adapted to selectively control flowing of the chemistry and a dilutant to the first vessel. The control mechanism may be operative to fill the second vessel with the chemistry, and to flow the dilutant to the first vessel via the second vessel.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.