Methods and systems for process monitoring using x-ray emission
US7365320B2 · kind B2 · utility
11Cited by
3References
52Claims
0Family size
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Key dates
| Filing date | Oct 8, 2003 |
| Grant date | Apr 29, 2008 |
| Priority date | — |
| Expiry date | Aug 10, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N23/2252
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Systems and methods for process monitoring based upon X-ray emission induced by a beam of charged particles such as electrons or ions include a system and method for process monitoring that analyze a cavity before being filled and then analyze emitted X-rays from the cavity after the cavity has been filled with a conductive material. Also included are system and methods for process monitoring that apply a quantitative analysis correction technique on detected X-ray emissions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.