Lithographic apparatus and device manufacturing method
US7365827B2 · kind B2 · utility
7Cited by
20References
34Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 8, 2004 |
| Grant date | Apr 29, 2008 |
| Priority date | — |
| Expiry date | Jun 11, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/709
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of the substrate table may be arranged to reduce the transmission of forces between the different parts.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.