Patent · US Expired

Method and apparatus for image formation

US7365829B2 · kind B2 · utility

0Cited by

2References

30Claims

0Family size

Assignee

Micronic Laser Systems AB · SE

Inventors

Måns Bjuggren · Bissenkamp, SE
Lars Ivansen · Solna, SE
Lars Stiblert · Göteborg, SE

Key dates

Filing date	Dec 10, 2002
Grant date	Apr 29, 2008
Priority date	—
Expiry date	Jun 19, 2023

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70433
WIPO fieldOptics
WIPO sectorInstruments

Abstract

The present invention relates to a method for adjusting a pattern to be imaged onto a workpiece. The pattern representing an image is divided in a plurality of regions. A pattern density in said plurality of region is computed. At least one feature in at least one of said plurality of regions is adjusted based on the pattern density in at least one other region. An adjusted pattern is fed to a modulator. The image is created on said workpiece by using said corrected pattern. The invention also relates to an apparatus for imaging adjusted pattern on a workpiece, a semiconducting wafer to be imaged with an adjusted pattern and a mask or a reticle to be imaged with an adjusted pattern.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.