Substrate processing unit and substrate processing apparatus
US7368016B2 · kind B2 · utility
10Cited by
10References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 27, 2005 |
| Grant date | May 6, 2008 |
| Priority date | — |
| Expiry date | Apr 27, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/76849
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A substrate processing unit includes: a vertically-movable substrate holder for holding a substrate; a pan surrounding a periphery of the substrate holder; a cell, located below the substrate holder and within the pan, having in its interior a chemical processing section; and a cell cover, capable of closing a top opening of the cell, having a plurality of spray nozzles for separately spraying at least two types of processing liquids, wherein the pan and the cell each have an individual liquid discharge line.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.