Memory cell arrays and methods for producing memory cell arrays
US7368350B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 20, 2005 |
| Grant date | May 6, 2008 |
| Priority date | — |
| Expiry date | Jun 28, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10B43/30
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method for fabricating stacked non-volatile memory cells and non-volatile memory cell arrays are disclosed. A semiconductor wafer is provided having a charge-trapping layer and a conductive layer deposited on the surface of the semiconductor wafer. Using a mask layer on top of the conductive layer, contact holes are formed into which a contact fill material is deposited. A further conductive layer is deposited on the surface of the semiconductor wafer and is patterned so as to form word lines. The contact fill material is connected to a contact plug using the contact holes with the contact fill material as a landing pad.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.