Method and device for immersion lithography
US7369217B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Oct 3, 2003 |
| Grant date | May 6, 2008 |
| Priority date | — |
| Expiry date | Nov 22, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70341
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates to an immersion lithographic system for patterning a work piece arranged at an image plane and covered at least partly with a layer sensitive to electromagnetic radiation. Said system comprising a source emitting electromagnetic radiation onto an object plane, a mask, adapted to receive and modulate said electromagnetic radiation at said object plane and to relay said electromagnetic radiation toward said work piece, and an immersion medium contacting at least a portion of a final lens of said lithographic system and a portion of said work piece, wherein an area of said contacting is restricted by capillary forces. The invention further relates to a method for patterning a workpiece.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.