Surface inspection apparatus, surface inspection method and exposure system
US7369224B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 2, 2005 |
| Grant date | May 6, 2008 |
| Priority date | — |
| Expiry date | Nov 9, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/9513
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A surface inspection apparatus includes an illumination means for illuminating a pattern formed through a predetermined pattern forming process containing a process of exposure of a resist layer formed on a substrate having a periodicity with a linearly polarized light, a setting means for setting a direction of the substrate such that a plane of vibration of the linear polarization and a direction of repetition of the pattern are obliquely to each other, an extraction means for extracting a polarization component having a plane of vibration perpendicular to that of the linear polarization out of specularly reflected light from the pattern, and an image forming means for forming an image of the surface of the substrate based on the extracted light. A pattern forming condition in the pattern forming process is specified based on the light intensity of the image of the surface of the substrate formed by the image forming means.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.