Full-field optical measurements of surface properties of panels, substrates and wafers
US7369251B2 · kind B2 · utility
4Cited by
13References
38Claims
0Family size
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Key dates
| Filing date | Jan 28, 2004 |
| Grant date | May 6, 2008 |
| Priority date | — |
| Expiry date | Dec 28, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B2290/35
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Techniques and systems for using optical interferometers to obtain full-field optical measurements of surfaces, such as surfaces of flat panels, patterned surfaces of wafers and substrates. Applications of various shearing interferometers for measuring surfaces are described.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.