Write once read only memory employing floating gates
US7369435B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Aug 30, 2005 |
| Grant date | May 6, 2008 |
| Priority date | — |
| Expiry date | Apr 9, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11C16/28
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Structures and methods for write once read only memory employing floating gates are provided. The write once read only memory cell includes a floating gate transistor formed in a modified dynamic random access memory (DRAM) fabrication process. The floating gate transistor has a first source/drain region, a second source/drain region, a channel region between the first and the second source/drain regions, a floating gate separated from the channel region by a gate insulator, and a control gate separated from the floating gate by a gate dielectric. A plug couples the first source/drain region to an array plate. A bitline is coupled to the second source/drain region. The floating gate transistor can be programmed by trapping charge on the floating gate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.