Ribbon beam ion implanter cluster tool
US7375355B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 12, 2006 |
| Grant date | May 20, 2008 |
| Priority date | — |
| Expiry date | Dec 2, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/26566
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An ion implantation cluster tool for implanting ions into a workpiece is provided, wherein a plurality of beamline assemblies having a respective plurality of ion beamlines associated therewith are positioned about a common process chamber. Each of the plurality of ion beamline assemblies are selectively isolated from the common process chamber, and the plurality of beamline intersect at a processing region of the process chamber. A scanning apparatus positioned within the common process chamber is operable to selectively translate a workpiece holder in one or more directions through each of the plurality of ion beamlines within the processing region, and a common dosimetry apparatus within the common process chamber is operable to measure one or more properties of each of the plurality of ion beamlines. A load lock chamber is operably coupled to the common process chamber for exchange of workpieces between the common process chamber and an external environment.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.