Apparatus for measuring feature widths on masks for the semiconductor industry

US7375792B2 · kind B2 · utility

Assignees

• Leica Microsystems Semiconductor GmbH · DE
• MueTec Automatisierte Mikroskopie und Meßtechnik GmbH · DE

Inventors

• Wolfgang Vollrath · Burbach, DE
• Frank Hillmann · Deggendorf, DE
• Gerd Scheuring · Munich, DE
• Hans-Jürgen Brueck · Munich, DE

Key dates

• Filing date: Sep 17, 2004
• Grant date: May 20, 2008
• Expiry date: Jun 7, 2026

Classification

• Technology area (CPC G): Physics
• CPC primary: G02B21/33
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

An apparatus for measuring feature widths on masks 1 for the semiconductor industry is disclosed. The apparatus encompasses a carrier plate 16 that is retained in vibrationally decoupled fashion in a base frame 14; a scanning stage 18, arranged on the carrier plate 16, that carries a mask 1 to be measured, the mask 1 defining a surface 4; and an objective 2 arranged opposite the mask 1. A liquid 25 is provided between the objective 2 and the surface 4 of the mask 1.