Utilities transfer system in a lithography system
US7375797B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jun 23, 2006 |
| Grant date | May 20, 2008 |
| Priority date | — |
| Expiry date | Jun 23, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70991
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Techniques for transferring utilities to and from a reticle or wafer stage in a lithography system while minimizing physical disturbances that affect the stage are described. These techniques involve transferring utilities to and from the stage without making physical contact with the stage. Alternatively, utilities are transferred by making physical contact with the stage while the stage is in a stationary position. In addition to transferring utilities to and from the stage, devices such as processing devices, buffers (storage mediums), electrical components, and mechanical components can be placed within the stage to use and/or control the transferred utilities.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.