Patent · US Expired

Method, program product and apparatus for generating assist features utilizing an image field map

US7376930B2 · kind B2 · utility

8Cited by
18References
16Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 29, 2004
Grant dateMay 20, 2008
Priority date
Expiry dateJan 31, 2026

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/70441
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

Disclosed concepts include a method, program product and apparatus for generating assist features for a pattern to be formed on the surface of a substrate by generating an image field map corresponding to the pattern. Characteristics are extracted from the image field map, and assist features are generated for the pattern in accordance with the characteristics extracted in step. The assist features may be oriented relative to a dominant axis of a contour of the image field map. Also, the assist features may be polygon-shaped and sized to surround the contour or relative to the inside of the contour. Moreover, the assist features may be placed in accordance with extrema identified from the image field map. Utilizing the image field map, a conventional and complex two-dimensional rules-based approach for generating assist feature can be obviated.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.