Lithographic apparatus, device manufacturing methods, mask and method of characterizing a mask and/or pellicle
US7379154B2 · kind B2 · utility
5Cited by
4References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 30, 2004 |
| Grant date | May 27, 2008 |
| Priority date | — |
| Expiry date | Apr 30, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/82
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A thick pellicle is allowed to have a non-flat shape and its shape is characterized to calculate corrections to be applied in exposures to compensate for the optical effects of the pellicle. The pellicle may be mounted so as to adopt a one-dimensional shape under the influence of gravity to make the compensation easier.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.