Method for determining lithographic focus and exposure
US7382447B2 · kind B2 · utility
26Cited by
42References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 26, 2002 |
| Grant date | Jun 3, 2008 |
| Priority date | — |
| Expiry date | Nov 9, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70641
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for determining one or more process parameter settings of a photolithographic system is disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.