Substrate processing method, substrate processing apparatus and substrate processing system
US7384484B2 · kind B2 · utility
10Cited by
6References
8Claims
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Key dates
| Filing date | Nov 3, 2003 |
| Grant date | Jun 10, 2008 |
| Priority date | — |
| Expiry date | Nov 3, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
After subjected to a developing process, a rinsing process and a replacing process in this order in a developing unit 10A, 10B, a substrate W wet with an anti-drying solution is wet-transported to a supercritical drying unit 20 by a primary transport robot 30. The supercritical drying unit 20 performs a high-pressure drying process (supercritical drying process) in a dedicated manner. Accordingly, by virtue of the presence of the anti-drying solution, the substrate W is effectively prevented from becoming air-dry during the transportation of the substrate W.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.