Methods, systems and computer program products for correcting photomask using aerial images and boundary regions
US7389491B2 · kind B2 · utility
3Cited by
7References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 8, 2005 |
| Grant date | Jun 17, 2008 |
| Priority date | — |
| Expiry date | Nov 28, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/84
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A correction method and a system thereof automatically perform a measurement and an analysis for a photomask critical dimension (CD), to satisfy a desired CD uniformity and a desired mean-to-target (MTT) data. A correction for a portion where a CD error has occurred may be performed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.