Radiation shield for cryogenic pump for high temperature physical vapor deposition
US7389645B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Nov 4, 2005 |
| Grant date | Jun 24, 2008 |
| Priority date | — |
| Expiry date | Oct 26, 2026 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/564
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method and apparatus to shield a cryogenic pump in a physical vapor deposition chamber comprising a physical vapor deposition chamber, a gasket in thermal contact with the physical vapor deposition chamber, at least one post in contact with the gasket, a radiation shield connected at the top of the post, and at least one intermediate ring in contact with the post. A method and apparatus for a radiation shield for a cryogenic pump comprising a cryogenic pump with a region upstream from the cryogenic pump, a gasket in thermal contact the region upstream from the cryogenic pump, at least one post in contact with the gasket, a radiation shield connected at the top of the post, and at least one intermediate ring in contact with the post.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.