Alan A. Ritchie
40Patents
4h-index
44Co-inventors
59Inventor score
Filing activity: Nov 4, 2005 → Sep 22, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9812303B2 | Configurable variable position closed track magnetron | Electricity | 33 | Active |
| US9580796B2 | Deposition apparatus and methods to reduce deposition asymmetry | Electricity | 32 | Active |
| US7824743B2 | Deposition processes for titanium nitride barrier and aluminum | Electricity | 22 | Active |
| US7422664B2 | Method for plasma ignition | Electricity | 5 | Expired |
| US9177763B2 | Method and apparatus for measuring pressure in a physical vapor deposition chamber | Electricity | 4 | Active |
| US8790499B2 | Process kit components for titanium sputtering chamber | Electricity | 4 | Active |
| US10692706B2 | Methods and apparatus for reducing sputtering of a grounded shield in a process chamber | Electricity | 3 | Active |
| US10741835B1 | Anode structure for a lithium metal battery | Emerging Cross-Sectional Technologies | 3 | Active |
| US9087679B2 | Uniformity tuning capable ESC grounding kit for RF PVD chamber | Electricity | 3 | Active |
| US9315891B2 | Methods for processing a substrate using multiple substrate support positions | Electricity | 2 | Active |
| US8846451B2 | Methods for depositing metal in high aspect ratio features | Electricity | 2 | Active |
| US7857947B2 | Unique passivation technique for a CVD blocker plate to prevent particle formation | Emerging Cross-Sectional Technologies | 2 | Active |
| US8865012B2 | Methods for processing a substrate using a selectively grounded and movable process kit ring | Electricity | 2 | Active |
| US8795487B2 | Physical vapor deposition chamber with rotating magnet assembly and centrally fed RF power | Electricity | 2 | Active |
| US8647484B2 | Target for sputtering chamber | Electricity | 2 | Active |
| US8535443B2 | Gas line weldment design and process for CVD aluminum | Emerging Cross-Sectional Technologies | 2 | Active |
| US8702918B2 | Apparatus for enabling concentricity of plasma dark space | Electricity | 1 | Active |
| US8563428B2 | Methods for depositing metal in high aspect ratio features | Chemistry; Metallurgy | 1 | Active |
| US9303311B2 | Substrate processing system with mechanically floating target assembly | Electricity | 1 | Active |
| US8795488B2 | Apparatus for physical vapor deposition having centrally fed RF energy | Electricity | 1 | Active |
| US11162170B2 | Methods for reducing material overhang in a feature of a substrate | Electricity | 1 | Active |
| US9028659B2 | Magnetron design for extended target life in radio frequency (RF) plasmas | Electricity | 1 | Active |
| US9957601B2 | Apparatus for gas injection in a physical vapor deposition chamber | Electricity | 1 | Active |
| US9593410B2 | Methods and apparatus for stable substrate processing with multiple RF power supplies | Electricity | 1 | Active |
| US7389645B2 | Radiation shield for cryogenic pump for high temperature physical vapor deposition | Chemistry; Metallurgy | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.