Aqueous fluoride compositions for cleaning semiconductor devices
US7399365B2 · kind B2 · utility
19Cited by
5References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 19, 2004 |
| Grant date | Jul 15, 2008 |
| Priority date | — |
| Expiry date | Jun 12, 2025 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/22
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
The present invention relates to dilute fluoride solutions and methods for cleaning plasma etch residue from semiconductor substrates including such dilute solutions. The compositions and methods according to the invention can advantageously provide both cleaning efficiency and material compatibility.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.