Method of treating a composite spin-on glass/anti-reflective material prior to cleaning
US7399708B2 · kind B2 · utility
0Cited by
206References
21Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 30, 2005 |
| Grant date | Jul 15, 2008 |
| Priority date | — |
| Expiry date | Jan 16, 2026 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/909
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Methods are provided for cleaning a microelectronic device, and one method includes providing a substrate having a patterned SOG/anti-reflective material; performing a process to cure the patterned SOG/anti-reflective material; and performing a cleaning process to remove the cured SOG/anti-reflective material. An apparatus for cleaning a microelectronic device is provided that includes a processing chamber; means for performing a SOG/anti-reflective material curing process within the processing chamber, means for performing a cleaning process within the processing chamber and means for venting the processing chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.