Environmental control in a reticle SMIF pod
US7400383B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 3, 2006 |
| Grant date | Jul 15, 2008 |
| Priority date | — |
| Expiry date | May 6, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67393
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The present invention provides a standardized mechanical interface (SMIF) reticle pod that is configured to provide a controlled environment for supporting a reticle wherein the controlled environment is maintained substantially free of crystal growth causing contaminants. Accordingly, there is provided a layered filter with filter elements capable of filtering particulates and adsorbing gaseous contaminants. The filter has an inwardly facing face generally planar shaped with a surface area that is substantially half or more of the area of the reticle face. The inwardly facing face is placed in close proximity to the reticle patterned surface and has an area that is a significant fraction of the reticle patterned surface area. The SMIF pod is also provided with a purge system configured to inject a very dry gas within the controlled environment to flush the controlled environment of contaminants as well as to regenerate the filter.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.