Methods of removing metal contaminants from a component for a plasma processing apparatus
US7402258B2 · kind B2 · utility
8Cited by
18References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 2, 2006 |
| Grant date | Jul 22, 2008 |
| Priority date | — |
| Expiry date | Nov 2, 2026 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/906
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
Methods of removing metal contaminants from a component for a plasma processing apparatus are provided. The method includes cleaning a surface of the component with a cleaning liquid that includes at least one acid selected from oxalic acid, formic acid, acetic acid, citric acid, and mixtures thereof.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.