Lithographic apparatus and device manufacturing method
US7405805B2 · kind B2 · utility
14Cited by
17References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 28, 2004 |
| Grant date | Jul 29, 2008 |
| Priority date | — |
| Expiry date | Jun 6, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70958
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In an immersion lithographic apparatus, a final element is disclosed having, on a surface nearest the substrate, a layer bonded to the surface and having an edge barrier, of the same material as the layer, extending from the layer away from the substrate to shield the final element from a liquid. In an embodiment, the final element is attached to the apparatus via the layer and/or edge barrier, which may be made of a material with a coefficient of thermal expansion lower than the coefficient of thermal expansion of the final element.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.