Patent · US Active

Illumination system particularly for microlithography

US7405809B2 · kind B2 · utility

2Cited by

13References

23Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Joachim Hainz · Aalen, DE
Wolfgang Singer · Aalen, DE
Erich Schubert · Ellwangen, DE

Key dates

Filing date	Mar 21, 2006
Grant date	Jul 29, 2008
Priority date	—
Expiry date	Jul 28, 2026

Classification

Technology area (CPC G)Physics
CPC primaryG21K2201/067
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An illumination system for scannertype microlithography along a scanning direction with a light source emitting a wavelength especially ≦193 nm. The illumination system includes a plurality of raster elements. The plurality of raster elements is imaged into an image plane of the illumination system to produce a plurality of images being partially superimposed on a field in the image plane. The field defines a non-rectangular intensity profile in the scanning direction.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.