Focused ion beam apparatus and focused ion beam irradiation method
US7411192B2 · kind B2 · utility
7Cited by
4References
28Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 27, 2005 |
| Grant date | Aug 12, 2008 |
| Priority date | — |
| Expiry date | May 24, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31749
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A focused ion beam apparatus and a focused ion beam irradiation method are disclosed. Even in the case where a magnetic field exists on the optical axis of an ion beam and the particular magnetic field undergoes a change, the ion beam is focused without separating the isotopes on the sample at the same ion beam spot position as if the magnetic field is not existent. A canceling magnetic field is generated on the optical axis of the ion beam from a canceling magnetic field generator thereby to offset the deflection of the ion beam due to the external magnetic field.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.