Lithographic apparatus and device manufacturing method
US7411654B2 · kind B2 · utility
17Cited by
17References
58Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 5, 2005 |
| Grant date | Aug 12, 2008 |
| Priority date | — |
| Expiry date | Jan 18, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70808
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.