Lithographic apparatus and device manufacturing method
US7411658B2 · kind B2 · utility
5Cited by
16References
32Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 6, 2005 |
| Grant date | Aug 12, 2008 |
| Priority date | — |
| Expiry date | Jul 12, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70341
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A protrusion is provided on a barrier member which at least partly confines a liquid between a projection system and a substrate. The protrusion is closer to the projection system than other parts of the barrier member to promote a meniscus of liquid to adhere between the protrusion and the projection system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.