Surface inspection apparatus and method thereof
US7417244B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jan 25, 2007 |
| Grant date | Aug 26, 2008 |
| Priority date | — |
| Expiry date | Jan 25, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/8854
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An apparatus for detecting defects, including: a first illumination optical unit which illuminates from a normal direction or in the vicinity of the normal direction; a second illumination optical unit which illuminates from a first elevation angle; a first detection optical unit which detects light reflected by the illumination of the first illumination optical unit or the second illumination optical unit with plural detectors; a second detection optical unit which detects light reflected by the illumination of the first illumination optical unit or the second illumination optical unit with plural detectors; wherein the plural detectors of the first detection optical unit and the plural detectors of the second detection optical unit are photomultipliers, and the signal processor processes the signals outputted from the photomultipliers and are adjusted to balance in sensitivities.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.