Mask CD measurement monitor outside of the pellicle area
US7422828B1 · kind B1 · utility
10Cited by
4References
12Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Feb 6, 2004 |
| Grant date | Sep 9, 2008 |
| Priority date | — |
| Expiry date | Oct 16, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/12
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of fabricating a photomask having a pellicle on a photomask substrate that facilitates accurate measurement of a critical dimension on the photomask, without requiring removal of the pellicle from the photomask substrate. A first pattern is transferred onto the photomask substrate in a first area, and at least one test pattern is transferred onto the photomask substrate outside of the first area. The pellicle is attached to the photomask substrate, wherein the pellicle covers the first area, but does not cover the at least one test pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.