Lithographic apparatus
US7423730B2 · kind B2 · utility
3Cited by
14References
30Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 19, 2004 |
| Grant date | Sep 9, 2008 |
| Priority date | — |
| Expiry date | May 19, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70191
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus including means for selectively transmitting a projection beam before imaging the patterned projection beam onto a substrate. The means may include any of the following: a selectively transmitting device disposed downstream of a patterning device in the direction of the projection beam, a fixed and a moving set of masking blades in a scanning system or an array of switchable elements. The means may be provided to a mask table/holder or to a frame or structure of the lithographic projection apparatus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.