Patent · US Active

Method of determining an illumination profile and device manufacturing method

US7425397B2 · kind B2 · utility

12Cited by

0References

18Claims

0Family size

Assignee

ASML NETHERLANDS B.V. · NL

Inventors

Jozef Maria Finders · Veldhoven, NL
Armand Eugene Albert Koolen · Nuth, NL

Key dates

Filing date	Sep 12, 2005
Grant date	Sep 16, 2008
Priority date	—
Expiry date	Mar 9, 2027

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70083
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An illumination profile useable in a lithographic apparatus to match the output of a target lithographic apparatus is obtained by obtaining a reference CD vs. pitch function for the lithographic projection apparatus at at least a plurality of pitch values using a reference illumination profile; obtaining a target CD vs. pitch function at at least the plurality of pitch values; generating a CD sensitivity map for the lithographic projection apparatus for a given pattern; calculating from the reference CD vs. pitch function, the target CD vs. pitch function and the CD sensitivity map, a suitable illumination profile to be used in said lithographic apparatus to expose said given pattern.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.