Atomic layer deposition on micro-mechanical devices

US7426067B1 · kind B1 · utility

Assignee

• The Regents of the University of Colorado · US

Inventors

• Victor M. Bright · Boulder, US
• Jeffrey W. Elam · Elmhurst, US
• Francois H. Fabreguette · Boise, US
• Steven M. George · Boulder, US
• Nils D. Hoivik · Pleasantville, US
• Yung-Cheng Lee · Boulder, US
• Ryan Linderman · Oakland, US
• Marie Tripp · Boulder, US

Key dates

• Filing date: Dec 17, 2002
• Grant date: Sep 16, 2008
• Expiry date: Dec 17, 2022

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S359/90
• WIPO field: Micro-structural and nano-technology
• WIPO sector: Chemistry

Abstract

A micro-electromechanical device or MEMS having a conformal layer of material deposited by atomic layer deposition is discussed. The layer may provide physical protection to moving components of the device, may insulate electrical components of the device, may present a biocompatible surface interface to a biological system, and may otherwise improve such devices. The layer may also comprise a combination of multiple materials each deposited with great control to allow creating layers of customizable properties and to allow creating layers having multiple independent functions, such as providing physical protection from wear and providing electrical insulation.