Electron beam column for writing shaped electron beams

US7427765B2 · kind B2 · utility

Assignee

• JEOL Ltd. · JP

Inventors

• Benyamin Buller · Cupertino, US
• William J. DeVore · Hayward, US
• Juergen Frosien · Ottobrunn, DE
• Xinrong Jiang · Palo Alto, US
• Richard L. Lozes · Pleasanton, US
• Henry Pearce-Percy · Los Gatos, US
• Dieter Winkler · Munich, DE
• Steven Thomas Coyle · Alameda, US
• Helmut Banzhof · Poing, DE

Key dates

• Filing date: Oct 3, 2005
• Grant date: Sep 23, 2008
• Expiry date: Mar 23, 2026

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01J2237/31754
• WIPO field: Micro-structural and nano-technology
• WIPO sector: Chemistry

Abstract

An electron beam column comprises a thermal field emission electron source to generate an electron beam, an electron beam blanker, a beam shaping module, and electron beam optics comprising a plurality of electron beam lenses. In one version, the optical parameters of the electron beam blanker, beam shaping module, and electron beam optics are set to achieve an acceptance semi-angle β of from about ¼ to about 3 mrads, where the acceptance semi-angle β is half the angle subtended by the electron beam at the writing plane. The beam-shaping module can also operate as a single lens using upper and lower projection lenses. A multifunction module for an electron beam column is also described.