Scanning probe microscopy method and apparatus utilizing sample pitch

US7429732B2 · kind B2 · utility

Assignee

• Veeco Instruments Inc. · US

Inventors

• David Kneeburg · Durham, US
• Rohit Jain · Danville, US
• Jason Osborne · Lompoc, US
• Wei Yao · Shanghai, CN
• Matthew Klonowski · Lompoc, US
• Ingo Schmitz · Duisburg, DE

Key dates

• Filing date: Sep 30, 2005
• Grant date: Sep 30, 2008
• Expiry date: Mar 7, 2026

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S977/854
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

The preferred embodiments are directed to a method and apparatus of operating a scanning probe microscope (SPM) to perform sample measurements using a survey scan that is less than five lines, and more preferably two lines, to accurately locate a field of features of a sample. This is accomplished by selecting a step distance between adjacent lines of the survey scan that does not equal the pitch of the features in a direction orthogonal to the direction the survey scan traverses, i.e., does not equal the pitch of the features in the scan direction, XPO. The aspect ratio of the scans can also be modified to further improve sample throughput.