Method and apparatus for scanning, stitching, and damping measurements of a double-sided metrology inspection tool
US7436506B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 1, 2006 |
| Grant date | Oct 14, 2008 |
| Priority date | — |
| Expiry date | Jul 3, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01R31/2831
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system for inspecting specimens such as semiconductor wafers is provided. The system provides scanning of dual-sided specimens using a damping arrangement which filters unwanted acoustic and seismic vibration, including an optics arrangement which scans a first portion of the specimen and a translation or rotation arrangement for translating or rotating the specimen to a position where the optics arrangement can scan the remaining portion(s) of the specimen. The system further includes means for stitching the scans together, thereby providing both damping of the specimen and the need for smaller and less expensive optical elements.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.