Delivery systems for efficient vaporization of precursor source material
US7437060B2 · kind B2 · utility
539Cited by
77References
20Claims
0Family size
Assignee
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Key dates
| Filing date | Jun 21, 2005 |
| Grant date | Oct 14, 2008 |
| Priority date | — |
| Expiry date | Oct 27, 2026 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01D1/0082
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A delivery system for vaporizing and delivering vaporized solid and liquid precursor materials at a controlled rate having particular utility for semiconductor manufacturing applications. The system includes a vaporization vessel, a processing tool and a connecting vapor line therebetween, where the system further includes an input flow controller and/or an output flow controller to provide a controlled delivery of a vaporizable source material to the vaporization vessel and a controlled flow rate of vaporized source material to the processing tool.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.