Lithographic apparatus, device manufacturing method and device manufactured thereby
US7440076B2 · kind B2 · utility
3Cited by
3References
35Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 29, 2005 |
| Grant date | Oct 21, 2008 |
| Priority date | — |
| Expiry date | Jun 14, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70875
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus arranged to transfer a pattern from a patterning structure onto a substrate is disclosed that includes a substrate holder configured to hold a substrate and a substrate temperature conditioner configured to condition a temperature of the substrate prior to, during, or both, a transfer of the substrate to the substrate holder to substantially match a temperature of the substrate holder.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.