Illumination system particularly for microlithography

US7443948B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Jorg Schultz · Aalen, DE
• Johannes Wangler · Oberkochen, DE
• Karl-Heinz Schuster · Oberkochen, DE
• Udo Dinger · Oberkochen, DE
• Wolfgang Singer · Aalen, DE
• Martin Antoni · Aalen, DE
• Joachim Wietzorrek · Aalen, DE
• Joachim Hainz · Aalen, DE

Key dates

• Filing date: Feb 2, 2006
• Grant date: Oct 28, 2008
• Expiry date: Apr 29, 2027

Classification

• Technology area (CPC G): Physics
• CPC primary: G21K1/062
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

There is provided an illumination system. the illumination system includes (a) a source of light having a wavelength of less than or equal to 193 nm, and (b) an optical element in a path of the light, having a first raster element, a second raster element, a third raster element and a fourth raster element situated thereon. The second raster element is adjacent to the first raster element, and located a first distance from the first raster element. The fourth raster element is adjacent to the third raster element, and located a second distance from the third raster element. The second distance is different from the first distance.