Lithographic apparatus and device manufacturing method
US7446849B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jul 22, 2004 |
| Grant date | Nov 4, 2008 |
| Priority date | — |
| Expiry date | Mar 17, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70908
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus is disclosed. The apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system includes a housing and a plurality of optical elements arranged in the housing. The apparatus also includes an inlet for feeding conditioned gas to the housing and a gas exhaust for exhausting the conditioned gas from the housing for providing a gas conditioned environment in the housing. At least one gate is provided for providing communication of the gas conditioned environment with ambient atmosphere. The gate is arranged to provide a predetermined leakage of the conditioned gas to the ambient atmosphere.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.