Control of X-ray beam spot size
US7453985B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 3, 2007 |
| Grant date | Nov 18, 2008 |
| Priority date | — |
| Expiry date | Jul 3, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N23/20
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method for analysis of a sample includes directing a beam of radiation to impinge on a target area on a surface of the sample along a beam axis at a plurality of different elevation angles. For each of the different angles, a respective offset of the beam in a direction transverse to the beam axis is determined. While sensing the radiation scattered from the sample at each of the different elevation angles in succession, a transverse correction is applied to at least one of the beam and the sample in order to compensate for the respective offset at each of the different elevation angles.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.