Magnetic enhancement for mechanical confinement of plasma
US7455748B2 · kind B2 · utility
6Cited by
5References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 20, 2003 |
| Grant date | Nov 25, 2008 |
| Priority date | — |
| Expiry date | Dec 3, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32623
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma processing apparatus for processing a substrate is provided. A plasma processing chamber with chamber walls is provided. A substrate support is provided within the chamber walls. At least one confinement ring is provided, where the confinement ring and the substrate support define a plasma volume. A magnetic source for generating a magnetic field for magnetically enhancing physical confinement provided by the at least one confinement ring is provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.