Lumin Li
36Patents
17h-index
44Co-inventors
81Inventor score
Filing activity: Jun 7, 1995 → Apr 10, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6527911B1 | Configurable plasma volume etch chamber | Electricity | 123 | Expired |
| US6178919A | Perforated plasma confinement ring in plasma reactors | Emerging Cross-Sectional Technologies | 113 | Expired |
| US5656123A | Dual-frequency capacitively-coupled plasma reactor for materials processing | Electricity | 94 | Expired |
| US6090304A | Methods for selective plasma etch | Electricity | 62 | Expired |
| US7732728B2 | Apparatuses for adjusting electrode gap in capacitively-coupled RF plasma reactor | Electricity | 46 | Active |
| US6833325B2 | Method for plasma etching performance enhancement | Electricity | 43 | Expired |
| US6106663A | Semiconductor process chamber electrode | Electricity | 40 | Expired |
| US6746961B2 | Plasma etching of dielectric layer with etch profile control | Electricity | 34 | Expired |
| US6506685B2 | Perforated plasma confinement ring in plasma reactors | Emerging Cross-Sectional Technologies | 33 | Expired |
| US6984288B2 | Plasma processor in plasma confinement region within a vacuum chamber | Emerging Cross-Sectional Technologies | 31 | Expired |
| US8080760B2 | Apparatuses for adjusting electrode gap in capacitively-coupled RF plasma reactor | Electricity | 30 | Active |
| US7683289B2 | Apparatus and method for controlling plasma density profile | Electricity | 27 | Active |
| US7405521B2 | Multiple frequency plasma processor method and apparatus | Electricity | 24 | Expired |
| US7525787B2 | Electrostatic chuck assembly with dielectric material and/or cavity having varying thickness, profile and/or shape, method of use and apparatus incorporating same | Electricity | 22 | Active |
| US5716485A | Electrode designs for controlling uniformity profiles in plasma processing reactors | Electricity | 19 | Expired |
| US7977390B2 | Method for plasma etching performance enhancement | Electricity | 19 | Active |
| US7749353B2 | High aspect ratio etch using modulation of RF powers of various frequencies | Electricity | 18 | Active |
| US8674255B1 | Apparatus and method for controlling etch uniformity | Performing Operations; Transporting | 13 | Active |
| US8299390B2 | Apparatus and method for controlling plasma density profile | Electricity | 12 | Active |
| US7144521B2 | High aspect ratio etch using modulation of RF powers of various frequencies | Electricity | 11 | Expired |
| US7169695B2 | Method for forming a dual damascene structure | Electricity | 8 | Expired |
| US7874807B2 | Air compressor with shut-off mechanism | Mechanical Engineering; Lighting; Heating | 7 | Active |
| US6716303B1 | Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same | Physics | 7 | Expired |
| US7632375B2 | Electrically enhancing the confinement of plasma | Emerging Cross-Sectional Technologies | 7 | Active |
| US7455748B2 | Magnetic enhancement for mechanical confinement of plasma | Electricity | 6 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.