Illumination system particularly for microlithography

US7456408B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Hans-Juergen Mann · Oberkochen, DE
• Wolfgang Singer · Aalen, DE
• Joerg Schultz · Aalen, DE
• Johannes Wangler · Oberkochen, DE
• Karl-Heinz Schuster · Oberkochen, DE
• Udo Dinger · Oberkochen, DE
• Martin Antoni · Aalen, DE
• Wilhelm Ulrich · Aalen, DE

Key dates

• Filing date: Jan 23, 2008
• Grant date: Nov 25, 2008
• Expiry date: Jan 23, 2028

Classification

• Technology area (CPC G): Physics
• CPC primary: G21K2201/061
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

There is provided an illumination system for microlithography. The illumination system includes an optical element having a plurality of field raster elements, a plane in which a field is illuminated, and a grazing incidence mirror situated in a light path from the optical element to the plane, after the optical element. The illumination system has no other grazing incidence mirror in the light path, after the optical element and before the plane.