Patent · US Active

Stage apparatus, lithographic apparatus and device manufacturing method

US7459701B2 · kind B2 · utility

7Cited by
19References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 8, 2005
Grant dateDec 2, 2008
Priority date
Expiry dateNov 16, 2026

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/707
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A stage apparatus for displacing an object having a substantially flat surface is described. The apparatus includes an object table for supporting the object and a positioning device for displacing the object table in a first direction. The apparatus further includes a clamping device for clamping the object to the object table by a first clamping force, the first clamping force being controlled by an electronic control unit based upon a state of the object.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.