Substrate temperature regulating support pins
US7461794B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 18, 2005 |
| Grant date | Dec 9, 2008 |
| Priority date | — |
| Expiry date | Jan 19, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG05D23/121
- WIPO fieldControl
- WIPO sectorInstruments
Abstract
A method and apparatus for regulating the temperature of substrates positioned within a chamber are provided. In one embodiment, a substrate support pin is provided that includes a body having a substrate support region defined at a first end and a mounting region defined at a second end of the body. A mounting feature is formed at the mounting region and is adapted to couple the body to a vacuum chamber body. A passage extends from the mounting region to the support region. An outlet formed through the body and orientated at an angle greater than zero relative to a centerline of the body is p provided to deliver fluids flowing through the passage out the first end of the body. In another embodiment, a chamber includes a pin configured to provide a temperature controlled fluid to an underside of a substrate supported on the pin.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.