Modified susceptor for barrel reactor
US7462246B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Apr 15, 2005 |
| Grant date | Dec 9, 2008 |
| Priority date | — |
| Expiry date | Apr 20, 2026 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S156/917
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A susceptor for supporting wafers during an chemical vapor deposition process. The susceptor has recesses and orifices disposed in the recesses extending to a central passage of the susceptor. The susceptor has exhaust openings disposed in the top of the susceptor to allow gas from the central passage of the susceptor to exit out the openings. A baffle plate covers the exhaust openings and a vertical space is created between the baffle plate and the top of the susceptor to allow gas to exit from the central passage to outside the susceptor. The bottom of the susceptor also has exhaust openings disposed therein. These openings allow gas from the central passage to exit the susceptor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.